APPLICATION METHOD OF PHOTOSENSITIVE MATERIAL, AND SLIT COATER FOR CARRYING OUT THE METHOD AND APPLICATION DEVICE USING THE SAME

摘要

PURPOSE: A method for applying photosensitive material which minimizes an inferior coating of photosensitive material is provided by improving the regularity in the supplying and dispensing amount of photosensitive material, thereby improving the uniformity in the thickness of the photosensitive materials applied to a substrate, wherein the improvement in regularity of the supplying and dispensing amount of photosensitive material is accomplished by storing the photosensitive materials in at least two cavity regions before dispensing and forming the photosensitive material into a shape of band by passing out at least one cavity region. CONSTITUTION: The method for applying photosensitive material comprises the steps of: (S2) changing the first rate and pressure of supplied photosensitive material to a second rate and pressure by supplying to a first cavity region having the first width and area, in order to make the dispensing pressure even; (S3) changing the second rate and pressure of supplied photosensitive material to a third rate and pressure by supplying to a second cavity region having a second width and area, in order to make the dispensing pressure more even; (S4) from the second cavity region, dispensing the photosensitive material supplied at a third rate and pressure in a shape of band; and (S5) applying the photosensitive material to a substrate with an even thickness.