| 摘要 |
PURPOSE: A substrate edge exposure apparatus is provided to reduce an exposure period for exposing each edge of wafers by forming a multi-stage wafer edge exposure unit. CONSTITUTION: A substrate edge exposure apparatus includes the first and the second light sources(100a,200a), the first and the second light guides(107,207), the first and the second irradiation nozzles(108,208), the first and the second rotary stages(103,203), the first and the second rotary stage driving motors(104,204), the first and the second exposure stages(100b,200b), and the first and the second controllers(100c,200c). Ultraviolet rays of the first and the second light sources(100a,200a) are irradiated on each edge of wafers loaded on the first and the second rotary stages(103,203) through the first and the second light guides(107,207) and the first and the second irradiation nozzles(108,208). The first and the second controllers(100c,200c) control the first and the second light sources(100a,200a) and each stage of the first and the second exposure stages(100b,200b).
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