发明名称 |
Ion beam incidence angle and beam divergence monitor |
摘要 |
A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.
|
申请公布号 |
US6690022(B2) |
申请公布日期 |
2004.02.10 |
申请号 |
US20020050636 |
申请日期 |
2002.01.16 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
LARSEN GRANT KENJI;PUROHIT ASHWIN;POITRAS ROBERT A.;EVANS MORGAN;BRENNAN DAMIAN |
分类号 |
H01J37/304;H01J37/317;(IPC1-7):H01J37/08;A61N5/00 |
主分类号 |
H01J37/304 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|