发明名称 Ion beam incidence angle and beam divergence monitor
摘要 A device for measuring an incidence angle of an ion beam impinging a planar substrate includes an aperture plate having an aperture for intercepting the ion beam and passing a beam portion therethrough, and a sensor located in the substrate plane or a plane parallel thereto behind the aperture plate and having a length along which the beam portion impinges on the sensor at a location which is a function of the incidence angle of the ion beam, the sensor configured to produce a sensor signal indicative of the location of impingement of the beam portion on the sensor and representative of incidence angle. A computing unit may be configured to compare the sensor signal to a predetermined function for determining the incidence angle of the ion beam. Spaced apart sensing devices may be used to determine beam divergence.
申请公布号 US6690022(B2) 申请公布日期 2004.02.10
申请号 US20020050636 申请日期 2002.01.16
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 LARSEN GRANT KENJI;PUROHIT ASHWIN;POITRAS ROBERT A.;EVANS MORGAN;BRENNAN DAMIAN
分类号 H01J37/304;H01J37/317;(IPC1-7):H01J37/08;A61N5/00 主分类号 H01J37/304
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