发明名称 System and method for electroplating fine geometries
摘要 An electroplating system is described which provides for the formation of a conductive layer on a workpiece. The current used to electroplate the workpiece is controlled by a controller. The rotation of the workpiece within a solution containing conductive material is controlled by a rotation controller. The current level and/or rotation of the workpiece is controlled in such a way that the non-uniform growth of large grains within the conductive film is minimized.
申请公布号 US6689686(B2) 申请公布日期 2004.02.10
申请号 US20020247000 申请日期 2002.09.19
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 GULDI RICHARD L.;HSU WEI-YUNG
分类号 C25D5/18;C25D5/04;C25D7/00;C25D7/12;C25D21/12;H01L21/288;(IPC1-7):H01L21/44 主分类号 C25D5/18
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