| 摘要 |
A molecular fluorine laser includes a discharge chamber filled with a gas mixture including molecular fluorine and a buffer gas and not including a laser active rare gas, multiple electrodes within the discharge chamber defining a discharge region therebetween connected to a pulsed discharge circuit for applying discharge pulses to the electrodes for energizing the gas mixture, and a resonator including the discharge chamber for generating an oscillator laser beam at a wavelength around 157 nm and a bandwidth of less than 0.6 pm. The laser further includes a power amplifier for increasing the energy of the attenuated oscillator laser beam to a second predetermined energy for lithographic processing, a line-narrowing unit for reducing the bandwidth, a low intensity suppressor module to suppress the weaker lines of the F2-laser, and a synchronization unit to synchronize the oscillator and amplifier.
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