| 摘要 |
PROBLEM TO BE SOLVED: To provide a monitoring method of a plasma treatment apparatus which can operate the plasma treatment apparatus always in a normal state by measuring optical data accurately even after the operation for a fixed time, and to provide the plasma treatment apparatus. SOLUTION: In the method, the operation condition of a plasma treatment apparatus 100 is monitored by using a plurality of detectors including an optical detector 20 for detecting optical data attached to the plasma treatment apparatus 100 by utilizing detection values of each detector detected for each workpiece. In the optical detector 20 for detecting optical data, the variation of detection values of the plasma treatment device 100 is recorded. Emission intensity from an optical source 30 provided in opposition to the optical detector 20 is detected immediately before each treatment and compared with emission intensity from the optical source 30 in the initial state of the plasma treatment device 100, and optical data are corrected. When emission intensity is attenuated to a specified value or lower, an alarm is emitted. COPYRIGHT: (C)2004,JPO
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