发明名称 EPITAXIAL WAFER FOR HETERO-JUNCTION BIPOLAR TRANSISTOR AND HETERO-JUNCTION BIPOLAR TRANSISTOR USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a novel epitaxial wafer for a hetero-junction bipolar transistor and the hetero-junction bipolar transistor that can prevent the leak of a current adjacent to an emitter layer and improve a current gain. SOLUTION: In the epitaxial wafer for the hetero-junction bipolar transistor that is provided with at least a collector layer 4, a base layer 5, an emitter layer 6, and an emitter contact layer 7 on a compound semiconductor substrate 2, the emitter contact layer 7 is doped with carbon at a specified concentration. Thus, recombination adjacent to the emitter layer 6 can be greatly reduced while avoiding the deterioration of a current gain due to the leakage of a current beforehand. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004039901(A) 申请公布日期 2004.02.05
申请号 JP20020195709 申请日期 2002.07.04
申请人 HITACHI CABLE LTD 发明人 MORIYA YOSHIHIKO;TSUJI TAKAYUKI
分类号 H01L21/331;H01L29/207;H01L29/737;(IPC1-7):H01L21/331 主分类号 H01L21/331
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