发明名称 |
Process for selecting a mask producer for a photomask for semiconductor wafer processing compares at least two masks |
摘要 |
A process for selecting a mask producer for semiconductor wafer photomask production from at least two masks comprises storing a maximum surface pattern for each, storing the relative cost based on the area ratio for the patterns, storing the specification data, finding the pattern forming ratio and selecting a mask on the basis of the price. An Independent claim is also included for an additional process using many patterns. |
申请公布号 |
DE10310073(A1) |
申请公布日期 |
2004.02.05 |
申请号 |
DE2003110073 |
申请日期 |
2003.03.07 |
申请人 |
MITSUBISHI DENKI K.K., TOKIO/TOKYO |
发明人 |
MORI, MASAYOSHI;HOSONO, KUNIHIRO;ARIMOTO, ICHIRO;KIKUTA, YUKO |
分类号 |
G03F1/08;G03F1/68;G06Q10/00;G06Q30/00;G06Q30/06;G06Q50/00;G06Q50/04;H01L21/00;H01L21/027;(IPC1-7):G03F1/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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