| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exhaust gas treatment apparatus which can control the amount of the exhaust gas to be discharged from each of several chambers so that one chamber can keep a sufficient vacuum without exerting a bad influence on the vacuum of another chamber, collect the exhaust gas discharged from each of the chambers and plasma-decompose the collected exhaust gas efficiently in a plasma decomposer and to provide an exhaust gas treating method. <P>SOLUTION: This exhaust gas treatment apparatus for plasma-decomposing the exhaust gas to be discharged from each of two or more separate chambers is provided with at least, first stage evacuating means arranged respectively on the chambers for discharging the exhaust gases from the respective chambers, centralizing pipelines for collecting the exhaust gas discharged through each of the first stage evacuating means, the plasma decomposer for plasma-decomposing the collected exhaust gas and a final stage evacuating means for discharging the plasma-decomposed gas. <P>COPYRIGHT: (C)2004,JPO</p> |
