发明名称 |
PROCESS FOR PREPARING SILICON SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To inhibit the change in diameter of a silicon single crystal bar by setting the set pull-up speed of the single crystal bar so as to give a constant V/G and precisely controlling the actual pull-up speed so that it matches the set pull-up speed. SOLUTION: While pulling up the silicon single crystal bar 24 from a silicon melt 13 melted by a heater 17, its diameter is detected at a predetermined time interval. The diameter of the silicon single crystal bar is controlled to achieve a predetermined diameter by feeding back the detection output to the pull-up speed of the silicon single crystal bar and to the temperature of the heater. When correcting the heater temperature to correct the pull-up speed, changes in the measured diameter of the silicon single crystal bar and in the pull-up speed are monitored, and the heater temperature is corrected to prevent the measured diameter from changing in the reverse direction of the predetermined diameter. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004035353(A) |
申请公布日期 |
2004.02.05 |
申请号 |
JP20020197139 |
申请日期 |
2002.07.05 |
申请人 |
SUMITOMO MITSUBISHI SILICON CORP |
发明人 |
WAKABAYASHI DAISUKE;SAITO MASAO;SATO SATOSHI |
分类号 |
C30B29/06;C30B15/26;(IPC1-7):C30B29/06 |
主分类号 |
C30B29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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