Preparation and use of an abrasive slurry composition

摘要

Particular aqueous slurry compositions including fine abrasive particles and polishing methods for polishing insulating films such as silicon dioxide and silicon nitride using such slurry compositions are provided in which the abrasive particles have a mean particle surface area of at least about 100 m<2>/g and the slurry compositions include the abrasive particles and at least one additive selected from potassium hydroxide, sodium hydroxide, ammonium hydroxide and amine compounds.