| 摘要 |
PURPOSE: A gas purification apparatus is provided, which effectively purifies unreacted flue gas exhausted in the manufacturing process of semiconductor equipment and minimizes particles accumulated on an inner part of discharge line of the gas purification apparatus. CONSTITUTION: The gas purification apparatus comprises a burning chamber(50) for burning and pyrolyzing unreacted flue gas; a wet type chamber(60) which is connected to the burning chamber, and in which a cleaning solution is contained to adsorb and contain the particles by receiving particles produced in the burning chamber; a gas exhaust line(80) which is tilted to a certain angle with being branched off from particle discharge line(70) for connecting the burning chamber and wet type chamber and exhausts combustion gas produced in the burning chamber; and a particle removal part(90) which is connected to the gas exhaust line, removes the particles contained in the combustion gas produced in the burning chamber and flows particles of the combustion gas in the wet type chamber, wherein the gas exhaust line is tilted to an angle of 5 to 85 degrees, wherein cleaning solution injection parts are installed inside the gas exhaust line to prevent particle accumulation, and wherein the particle removal part comprises a plurality of cleaning solution injection parts for removing the particles by adsorbing particles contained in the combustion gas.
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