发明名称 THIN-FILM FORMING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a thin-film forming apparatus for restraining staining of a discharge face of an electrode, by inhibiting a reactive gas and a discharge gas from mixing in a discharge space. <P>SOLUTION: The thin film production apparatus is provided with a discharge space in which a first electrode and a second electrode are arranged so as to face each other, and a gas supply means for supplying the discharge gas and the reactive gas respectively and individually into the above discharge space. The reactive gas supply port of the above gas supply port for supplying the above discharge gas and the reactive gas respectively and individually to the above discharge space is arranged at a distance of d satisfying the following expression (1): 0<d<D (wherein D is the distance between the first electrode and the second electrode), from the above second electrode. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004035977(A) 申请公布日期 2004.02.05
申请号 JP20020197154 申请日期 2002.07.05
申请人 KONICA MINOLTA HOLDINGS INC 发明人 KONDO YOSHIKAZU;MIZUNO KO;FUKAZAWA KOJI
分类号 H05H1/24;B01J19/08;C23C16/44;C23C16/507 主分类号 H05H1/24
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