| 摘要 |
PROBLEM TO BE SOLVED: To provide an oxidation method of a workpiece capable of obtaining an oxide film with excellent film quality and a layered structure of a nitride film and an oxide film by applying thermal oxidation to the nitride film. SOLUTION: In the oxidation method whereby the surface of the workpieces W, on which at least the nitride film is exposed, is oxidized in a processing vessel 8 accommodating a plurality of the workpieces W concurrently, the nitride film is oxidized by mainly using hydroxyl active species and oxygen active species in a vacuum atmosphere under a process pressure of 133 Pa or below at a process temperature of 400°C. Thus, in the case of oxidizing the nitride film of the surface of a plurality of the workpieces W, the interfacial uniformity is maintained high and the oxide film with excellent film quality can be obtained. COPYRIGHT: (C)2004,JPO
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