发明名称 DESIGN METHOD OF SEMICONDUCTOR DEVICE, DESIGN PROGRAM OF SEMICONDUCTOR DEVICE, AND DESIGN EQUIPMENT OF SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To design a semiconductor device wherein densities of a dummy pattern and a design pattern are made uniform in all the parts of a semiconductor chip. <P>SOLUTION: (Step S1) A layout pattern 1a of a layout layer of a semiconductor device is divided into division regions 2a, 2b, ... as shown in a layout pattern 1b. (Step S2) A dummy pattern is inserted between design patterns of the division regions as shown in a division region enlarged view A of a layout pattern 1c. (Step S3) The density of the dummy pattern and the design pattern is calculated for every division region. (Step S4) The pattern rule of the dummy pattern for every division region is changed as shown in a dummy pattern 4b of a division region enlarged view B of a layout pattern 1d so that the density becomes a desired value. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004039951(A) 申请公布日期 2004.02.05
申请号 JP20020196865 申请日期 2002.07.05
申请人 FUJITSU LTD 发明人 OBA HISAYOSHI;WATANABE ATSUSHI
分类号 G06F17/50;H01L21/768;H01L21/82;H01L21/822;H01L23/528;H01L27/04;(IPC1-7):H01L21/82 主分类号 G06F17/50
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