发明名称 REFLECTION MIRROR DEVICE, ALIGNER, AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress the temperature rise of a mirror used for a reflecting optical system in an aligner and maintain an accuracy of surface shape of a mirror reflection plane. SOLUTION: A reflective mirror device used for the reflecting optical system in the aligner for exposure processing by guiding an exposure beam by reflection has a mirror 30 having a reflection plane for reflecting an exposure beam 2d, and radiation plates 25a to 25e for radiation cooling arranged apart from an external surface of the mirror 30. The raidation plates 25a to 25e are arranged so that a pass zone of the exposure beam entered to and reflected from the mirror 30 is secured. Each of radiation plates 25a to 25e is temperature controlled by coolant passing through cooling pipes 23a to 23e. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004039696(A) 申请公布日期 2004.02.05
申请号 JP20020191282 申请日期 2002.06.28
申请人 CANON INC 发明人 MIYAJIMA GIICHI
分类号 G02B5/10;G02B17/00;G03F7/20;G21K1/06;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B5/10
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