| 摘要 |
A focused ion beam (FIB) apparatus is used to record analog (i.e. continuous) and/or digital (i.e. discrete) images or data within a medium, which is then recoverable by exposing this storage medium to a light source and observing the light reflected, transmitted, and/or diffracted by the medium from a specified reception point relative to the source light and the medium surface. Changes in the optical properties of the medium surface can be achieved in a controllable and predictable way over spatial regions as small as the tightest focus of a FIB in one or several of the following ways (In the following list, "structure" is defined as a polished, solid surface to which has been added either none, one, or several optical thin films of materials which differ from the adjacent materials): 1) Changes in structure optical properties due to implantation into a substrate. 2) Changes in structure optical properties due to implantation into and milling of a substrate. 3) Changes in structure optical properties due to implantation into optical thin film on a substrate or optical thin film structure. 4) Changes in structure optical properties due to implantation into and milling of optical thin film on a substrate or optical thin film structure. 5) Changes in structure optical properties due to etching of implanted region on a substrate. 6) Changes in structure optical properties due to etching of implanted region in an optical thin film on a substrate or optical thin film structure. Optical changes can be observed within individual regions, or collectively by the process of diffraction, depending upon the optical system employed to recover the stored information.
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