发明名称 |
CHEMICAL-MECHANICAL POLISHING METHOD UTILIZING WIRING DESIGN DATA, METHOD FOR MANUFACTURING WORKED PRODUCT AND METHOD FOR DETERMINING DESIGN RULE |
摘要 |
PROBLEM TO BE SOLVED: To perform chemical-mechanical polishing by determining a process control model and a recipe without performing an experiment for setting a manufacturing condition. SOLUTION: A manufacturing system provided with a function for acquiring start result data and inspection result data is provided with a means for forming a solid shape on the surface of an LSI chip in an arbitrary process of a process flow by relating wiring design data to the process flow, and a means for transmitting/receiving data between a process simulator and a starting system. Since the manufacturing system finds out a polished shape by generating a pre-polishing shape on the basis of the wiring design data of all processes in the process flow before the start of polishing and performing process simulation, the polishing rate of each product can be detected and a polishing time capable of obtaining a prescribed management time can be determined. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004040004(A) |
申请公布日期 |
2004.02.05 |
申请号 |
JP20020198094 |
申请日期 |
2002.07.08 |
申请人 |
RENESAS TECHNOLOGY CORP |
发明人 |
MORISAWA TOSHIHIRO;SAWA SHINJI;ARAI TOSHIYUKI;OTAKE ATSUSHI |
分类号 |
H01L21/3205;H01L21/02;H01L21/304;H01L21/82;(IPC1-7):H01L21/320 |
主分类号 |
H01L21/3205 |
代理机构 |
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主权项 |
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