发明名称 APPARATUS AND METHOD FOR MANUFACTURING SILICON
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing apparatus in which uniform reaction and precipitation and efficient and stable operation can be carried out by dividing a reaction furnace into a plurality of sections and independently controlling the temperature in each divided section as programmable, as a manufacturing apparatus for high purity silicon by a vapor phase zinc reduction method, and to provide a manufacturing method. SOLUTION: The reaction furnace is divided into a plurality of sections, and the temperature in each section is varied as the reaction conditions in the furnace. Thus, the reduction reaction and precipitation can be stably carried out for a long period of time to improve the manufacture efficiency. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004035384(A) 申请公布日期 2004.02.05
申请号 JP20020230612 申请日期 2002.07.05
申请人 KAMAIKE YUTAKA;YAMASE HIDEO 发明人 YAMASE HIDEO;KAMAIKE YUTAKA
分类号 C01B33/033;(IPC1-7):C01B33/033 主分类号 C01B33/033
代理机构 代理人
主权项
地址