发明名称 Method and system for correction of intrinsic birefringence in UV microlithography
摘要 Systems and methods for improved correction of intrinsic birefringence are provided. Two pairs of optical elements correct for intrinsic birefringence of optical materials. A combination of design criteria for the set of optical elements, including refractive power type, intrinsic birefringence signs, and crystal axis rotation, is used to correct for intrinsic birefringence.
申请公布号 US2004021943(A1) 申请公布日期 2004.02.05
申请号 US20020304995 申请日期 2002.11.27
申请人 ASML US, INC. 发明人 SEWELL HARRY
分类号 G02B5/00;G02B1/02;G02B13/14;G03F7/20;H01L21/027;(IPC1-7):G02B13/14;G02B5/30;G02B27/28 主分类号 G02B5/00
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