| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processor which can regulate arbitrarily the temperature of its processing pedestal and its exhaust duct by a simple configuration. SOLUTION: The vacuum processor has a processing chamber 3 for processing a processed objects in a reduced-pressure atmosphere, a processing pedestal 4 provided in the processing chamber 3 and for mounting thereon the objects to be processed, an exhaust duct 11 for connecting the processing chamber 3 and an exhaust pump for reducing the inner pressure of the processing chamber 3, and refrigerant passages 14a, 14b for feeding a refrigerant in a circulative way to the processing pedestal 4 and the exhaust duct 11 from a refrigerant circulating apparatus 10 via a refrigerant feeding path. Further, this vacuum processor is provided with a thermostat 14 for regulating the temperature of the refrigerant, on the inflow side of either one of the refrigerant passages wherethrough the refrigerant circulates among the processing pedestal 4 and the exhaust duct 11. COPYRIGHT: (C)2004,JPO |
