发明名称 |
METHOD FOR MANUFACTURING THIN-FILM MULTILAYER DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To enable a continuous process for multilayer formation without interrupting a vacuum process. SOLUTION: A base substrate 11 is a 125μm-thick polyimide substrate, and oil 12 is Fomblin oil. The oil 12 is heated in a vacuum in a heater-installed tank for vaporization, and vapor is discharged out of a fine nozzle and applied to the base substrate 11. An aluminum conductor 13 is then formed by sputtering aluminum, and is converted into a capacitor electrode. Next, the aluminum conductor 13 for electrode formation is oxidized in plasma for conversion into an aluminum oxide for the formation of a dielectric layer 14. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004039852(A) |
申请公布日期 |
2004.02.05 |
申请号 |
JP20020194645 |
申请日期 |
2002.07.03 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
SUETSUGU DAISUKE;NISHIHARA MUNEKAZU;HIGASHIDA TAKAAKI;YAMAMOTO KENICHI;OKUMA TAKAFUMI;NAKAJIMA SEIJI |
分类号 |
H01G4/30;(IPC1-7):H01G4/30 |
主分类号 |
H01G4/30 |
代理机构 |
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主权项 |
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地址 |
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