| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for improving reliability of a reactor for stably performing, in particular, etching or vapor deposition by effectively removing chlorine-based residues adsorbed by a reaction tube. SOLUTION: This method comprises a step of preparing a reactor (including an etching apparatus and a vapor deposition apparatus) using chlorine-based gases, and a step of removing residues present in a reaction tube by forming plasma containing at least one of hydrogen and nitrogen in the reactor. COPYRIGHT: (C)2004,JPO
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