发明名称 MANUFACTURING PROCESS FOR GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing process for a gas barrier film which does not contain chlorine in the structure and is excellent in oxygen gas barrier properties at a high humidity. SOLUTION: The manufacturing process for a gas barrier film comprises treating a gas barrier polymer layer (D) formed from a composition (C) containing a polyalcohol polymer (A) and a polymer (B) mainly comprising itaconic acid units with water containing an at least divalent metal compound (E). The oxygen permeability of thus obtained film at 25°C at a relative humidity of 80% is 50 cc/(m<SP>2</SP>×24h×atm) or lower. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004035832(A) 申请公布日期 2004.02.05
申请号 JP20020197665 申请日期 2002.07.05
申请人 TOYO INK MFG CO LTD 发明人 KATO SHUNICHI;KAMOSHITA MIYUKI
分类号 C08J7/04;B32B27/30;C08F22/02;C08J7/12;(IPC1-7):C08J7/04 主分类号 C08J7/04
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