发明名称 |
MANUFACTURING PROCESS FOR GAS BARRIER FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing process for a gas barrier film which does not contain chlorine in the structure and is excellent in oxygen gas barrier properties at a high humidity. SOLUTION: The manufacturing process for a gas barrier film comprises treating a gas barrier polymer layer (D) formed from a composition (C) containing a polyalcohol polymer (A) and a polymer (B) mainly comprising itaconic acid units with water containing an at least divalent metal compound (E). The oxygen permeability of thus obtained film at 25°C at a relative humidity of 80% is 50 cc/(m<SP>2</SP>×24h×atm) or lower. COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004035832(A) |
申请公布日期 |
2004.02.05 |
申请号 |
JP20020197665 |
申请日期 |
2002.07.05 |
申请人 |
TOYO INK MFG CO LTD |
发明人 |
KATO SHUNICHI;KAMOSHITA MIYUKI |
分类号 |
C08J7/04;B32B27/30;C08F22/02;C08J7/12;(IPC1-7):C08J7/04 |
主分类号 |
C08J7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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