| 摘要 |
PROBLEM TO BE SOLVED: To deposit a finely patterned magnetic material film. SOLUTION: In a thin film magnetic head, an upper magnetic pole layer 27 prescribing a record track width has a first layer 27a in contact with a record gap layer 25 and a second layer 27b arranged on the first layer 27a. The upper magnetic pole layer 27 is formed as follows. At first, a magnetic layer is formed on the record gap layer 25. Next, the second layer 27b is formed on the magnetic layer by a plating method. Then, the magnetic layer 26 is selectively etched by reactive ion etching with the second layer 27b as a mask, and the first layer 27a is formed. In the reactive ion etching, an etching gas comprising a halogen based gas and a carbon oxide based gas is used. COPYRIGHT: (C)2004,JPO
|
