| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam lithography apparatus using a patterned emitter. SOLUTION: A pyroelectric emitter performs electron emission using a patterned metal thin film as a mask. When the emitter is heated, electrons are not emitted from portions of the emitter covered by a metal thin layer, while the electrons are emitted from portions covered by a dielectric film, thereby an emitter pattern is projected on a substrate. To prevent the diffusion of the emitted electron beam, the electron beam is controlled by a magnet, direct magnetic field generator, or deflection device. COPYRIGHT: (C)2004,JPO
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