发明名称 Light intensity simulation method, program product, and designing method of photomask
摘要 Light intensities at light intensity calculation points on the photomask are found approximately based on distances from barycenters of opening patterns, and areas and transmission factors of the opening patterns. Thereafter, the result is added to a distribution of light intensity which is obtained by the conventional simulation without consideration given to the influence of the local flare. According to such a method, it is possible to easily carry out the simulation of the light intensity with high accuracy.
申请公布号 US2004025138(A1) 申请公布日期 2004.02.05
申请号 US20030353938 申请日期 2003.01.30
申请人 FUJITSU LIMITED 发明人 FUTATSUYA HIROKI;OSAWA MORIMI
分类号 G03F1/08;G03F1/36;G03F1/68;G03F7/20;H01L21/027;(IPC1-7):G06F17/50 主分类号 G03F1/08
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