发明名称 |
Light intensity simulation method, program product, and designing method of photomask |
摘要 |
Light intensities at light intensity calculation points on the photomask are found approximately based on distances from barycenters of opening patterns, and areas and transmission factors of the opening patterns. Thereafter, the result is added to a distribution of light intensity which is obtained by the conventional simulation without consideration given to the influence of the local flare. According to such a method, it is possible to easily carry out the simulation of the light intensity with high accuracy. |
申请公布号 |
US2004025138(A1) |
申请公布日期 |
2004.02.05 |
申请号 |
US20030353938 |
申请日期 |
2003.01.30 |
申请人 |
FUJITSU LIMITED |
发明人 |
FUTATSUYA HIROKI;OSAWA MORIMI |
分类号 |
G03F1/08;G03F1/36;G03F1/68;G03F7/20;H01L21/027;(IPC1-7):G06F17/50 |
主分类号 |
G03F1/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|