发明名称 CAPACITOR STRUCTURE IN LOW TEMPERATURE POLYSILICON DISPLAY
摘要 PROBLEM TO BE SOLVED: To provide a capacitor structure in a low temperature polysilicon display. SOLUTION: The capacitor structure in a low temperature polysilicon display comprises a buffer layer on a substrate, a polysilicon layer on the buffer layer, a dielectric layer on the polysilicon layer, and a conductive layer on the dielectric layer wherein at least one layer has a non-flat structure. A pixel structure of an LTPS thin film transistor display is formed by combining the inventive capacitor structure with a thin film structure manufactured by an LTPS manufacturing process. The capacitor structure has the wider surface of a capacitor as compared with that of a conventional display. Consequently, the capacity and the opening area ratio of the LTPS display are increased. A manufacturing process is simple. The quality of the display is enhanced greatly by simply adding an extra process to the conventional manufacturing process of LTPS display. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004040075(A) 申请公布日期 2004.02.05
申请号 JP20030042328 申请日期 2003.02.20
申请人 IND TECHNOL RES INST 发明人 KUNG NIEN-HUI;CHIN SHIKO
分类号 H01L27/04;H01L21/77;H01L21/822;H01L21/8234;H01L21/84;H01L27/06;H01L27/08;H01L27/12;H01L27/13;(IPC1-7):H01L21/822;H01L21/823 主分类号 H01L27/04
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