| 摘要 |
PROBLEM TO BE SOLVED: To provide a multilayer reflector capable of recovering easily reflectivity of the multilayer reflector by removing scattered particles adhering to the multilayer surface, its manufacturing method, a reflectivity recovery method of the multilayer reflector, and a soft X-ray optical system and a soft X-ray exposing device. SOLUTION: This multilayer reflector equipped with a multilayer film formed by laminating at least two kinds of materials having different refractive indexes alternately or cyclically with a fixed cycle length, is equipped with a multilayer film 20 formed on a substrate and an Ag layer 23 formed on the uppermost layer of the multilayer film. When recovering the reflectivity of the multilayer reflector, the Ag layer 23 of the multilayer reflector wherein tungsten which is a scattered particle adheres to the Ag layer 23 is dissolved by nitric acid, to thereby remove tungsten and the Ag layer 23 from the multilayer film 20, and then an Ag later 24 is reformed on the uppermost layer of the multilayer film 20. COPYRIGHT: (C)2004,JPO |
