发明名称 PHOTOCURABLE RESIN COMPOSITION CONTAINING CYCLIC ACETAL COMPOUND AND ITS CURED PRODUCT
摘要 PROBLEM TO BE SOLVED: To provide a photocurable resin composition with a low viscosity which can be fully cured to the interior in a short period of irradiation time. SOLUTION: This photocurable resin composition comprises (A) a cyclic acetal compound, (B) an epoxy compound and (C) a photocationic polymerization initiator. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004035862(A) 申请公布日期 2004.02.05
申请号 JP20020198871 申请日期 2002.07.08
申请人 POLYPLASTICS CO 发明人 KANAI HIROYUKI
分类号 C08F2/46;C08G2/10;C08G2/18;C08G59/68;C08L63/00;G03F7/038;(IPC1-7):C08G59/68 主分类号 C08F2/46
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