发明名称 |
OXYGEN ION IMPLANTATION DEVICE AND SILICON WAFER WITH IMPLANTED OXIDE FILM MANUFACTURED BY USING THE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To solve problems in a conventional device that implantation can not be completed with uniform wafer temperature distribution by beam power from intermittent irradiation and it is difficult to manufacture an SOI-SIMOX wafer having a uniform silicon layer due to the ununiformity of temperature distribution. SOLUTION: A beam cross-sectional shape controller 13 capable of changing a beam width when ion implantation reaches the prescribed quantity of implantation is used. An output signal from the controller 13 is inputted to a driving power supply 7' for magnetic four-electrode lenses 7 for changing the beam width. The quantity of implantation for changing the beam width is set in the controller 13 as a prescribed value, or a value determined from a controller (e.g. a personal computer) for performing an implantation operation. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004040003(A) |
申请公布日期 |
2004.02.05 |
申请号 |
JP20020198084 |
申请日期 |
2002.07.08 |
申请人 |
HITACHI HIGH TECH CORP |
发明人 |
TOKIKUCHI KATSUMI;ITO JUNYA;SEKI HIROBUMI;SEKI TAKAYOSHI;MERA KAZUO;HASHIMOTO ISAO;NATSUI KENICHI;BANDO AKIRA |
分类号 |
H01J27/16;H01J37/04;H01J37/08;H01L21/02;H01L21/265;H01L21/76;H01L21/762;H01L27/12;(IPC1-7):H01L27/12 |
主分类号 |
H01J27/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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