发明名称 APPARATUS AND METHOD FOR CLEANING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To prevent that the mist in a cleaning solution is attached to one surface of a substrate while the other surface of the substrate is subjected to ultrasonic cleaning. SOLUTION: A plurality of substrate holding pins 13 are erected from a holding base 12, and the substrate W is mechanically held from its circumferential direction in the state in whichthe rear surface Sb of the substrate W faces upward. Between the substrate W and the holding base 12, a drip-proof plate 14 having almost the same shape as that of the substrate W is disposed in a position distant from the substrate W so as to cover the front surface (pattern surface) Sf of the substrate W from below. Hence, although the mist generates in the cleaning solution and its portion is splashed to the front surface Sf side of the substrate W while the rear surface Sb of the substrate W is cleaned by ultrasonic cleaning with the ultrasonically vibrated cleaning solution, the mist can be prevented from being attached to the front surface Sf of the substrate with the help of the drip-proof plate 14 which is disposed so as to cover the front surface Sf of the substrate W, thereby effectively preventing a creeping in of the mist. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004039843(A) 申请公布日期 2004.02.05
申请号 JP20020194418 申请日期 2002.07.03
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HIRAE SADAO
分类号 G02F1/13;B08B1/00;B08B3/02;B08B3/12;G02F1/1333;G11B7/26;H01L21/00;H01L21/304;(IPC1-7):H01L21/304;G02F1/133 主分类号 G02F1/13
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