PLASMA TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of preventing plasma from being diffused to the lower part of a vacuum container without lowering a gas exhaust characteristic.

SOLUTION: Shield meshes having two kinds of hole diameters are halved and arranged on a wafer-present side and an absent part of the vacuum container; and holes of diameter small enough to securely prevent discharge diffusion are formed in a punching metal shape on a surface which is nearly perpendicular to a gas flow and holes of a diameter large enough to secure the exhaust characteristic are formed in a punching metal shape on a surface which is nearly parallel to the gas flow. Or shield meshes having a certain angle relative to the gas flow are halved and arranged on the wafer-present side and absent side of the vacuum container.

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