| 摘要 |
<p>A process for forming a coating film on a substrate surface, which comprises preparing a reaction mixture comprising a silicon compound (A) of the following formula (1): Si(OR4) wherein R is a C1-5 alkyl group, a silicon compound (B) of the following formula (2): CF3(CF2)nCH2CH2Si(OR<1>)3 wherein R<1> is a C1-5 alkyl group, and n is an integer of from 0 to 12, an alcohol (C) of the following formula (3): R<2>CH2OH wherein R<2> is a hydrogen atom, or an unsubstituted or substituted C1-12 alkyl group, and oxalic acid (D), in a ratio of from 0.05 to 0.43 mol of the silicon compound (B) per mol of the silicon compound (A), in a ratio of from 0.5 to 100 mol of the alcohol (C) per mol of the total alkoxy groups contained in the silicon compounds (A) and (B), and in a ratio of from 0.2 to 2 mol of the oxalic acid (D) per mol of the total alkoxy groups contained in the silicon compounds (A) and (B); heating this reaction mixture at a temperature of from 50 to 180 DEG C until the total amount of the silicon compounds (A) and (B) remaining in the reaction mixture becomes at most 5 mol%, while maintaining a SiO2 concentration of from 0.5 to 10 wt% as calculated from silicon atoms in the reaction mixture and maintaining absence of water, to form a polysiloxane solution; then coating a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating; and heat-curing the coating at a temperature of from 80 to 450 DEG C to form a coating film having a refractive index of from 1.28 to 1.38 and a contact angle of water of from 90 to 115 DEG , as adhered on the substrate surface.</p> |
