发明名称 DIFFERENTIAL PRESSURE TYPE FLOW CONTROLLER FOR GAS USED IN SEMICONDUCTOR PROCESS
摘要 <p>PURPOSE: A differential pressure flow controller for gases used in semiconductor process is provided to measure and control accurately the flow of the semiconductor process gas by generating the differential pressure from the flow path of the semiconductor process gas. CONSTITUTION: A body(10) includes a flow path of gases. A control valve(20) is used for controlling the flow of the semiconductor process gas by opening or shutting the flow path of the body. A differential pressure generation element(30) is used for generating the differential pressure from the flow path of the body. A tube(40) penetrates the differential pressure generation element. A pressure sensor(50) is inserted into the tube in order to detect the differential pressure of the flow path due to the differential pressure generation element. A CPU(Central Processing Unit)(60) produces the flow of the gases and controls the control valve according to a detection signal of the pressure sensor.</p>
申请公布号 KR100418684(B1) 申请公布日期 2004.02.02
申请号 KR20030042584 申请日期 2003.06.27
申请人 AHN, KANG HO;HYUNDAI CALIBRATION & CERTIFICATION TECHNOLOGIES CO., LTD. 发明人 AHN, KANG HO;LEE, SOO CHAN;KWON, YONG TAEK;CHOI, JEONG SUK;YOON, JIN UK
分类号 H01L21/02;G05D7/06;(IPC1-7):H01L21/02 主分类号 H01L21/02
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