发明名称 METHOD FOR SELECTING MASK MAKER
摘要 PURPOSE: To select a mask maker that manufactures a low-priced photomask. CONSTITUTION: The selecting method includes: a step (S104) of receiving 100% drawing area data and unit-price data from a mask mater computer; a step (S110) of extracting a 100% code meeting a condition according to the 100% area data when data are received from more than a predetermined number of mask maker computers (YES at S108); a step (S112) of calculating a drawing area rate according to the 100% drawing area of the extracted 100% code and the drawing area of drawing area data; a step (S114) of calculating a unit price from the drawing area rate according to the unit-price data and drawing area rate; and a step (S116 ) of determining a mask maker as an ordering destination according to the calculated unit price.
申请公布号 KR20040010079(A) 申请公布日期 2004.01.31
申请号 KR20030019100 申请日期 2003.03.27
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MORI MASAYOSHI;HOSONO KUNIHIRO;ARIMOTO ICHIRO;KIKUTA YUKO
分类号 G03F1/08;G03F1/68;G06Q10/00;G06Q30/00;G06Q30/06;G06Q50/00;G06Q50/04;H01L21/00;H01L21/027;(IPC1-7):H01L21/00 主分类号 G03F1/08
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