| 摘要 |
PURPOSE: A vertical furnace for processing a semiconductor wafer is provided to easily detach a cap cover by forming the cap cover of a structure that can be detached to be right and left cap covers, and to easily attach the cap cover by attaching the right and left cap covers. CONSTITUTION: A wafer process spacer is defined by an inner tube. An outer tube seals the inner tube, installed outside the inner tube. The inner tube and the outer tube are mounted on a flange. A heater heats the inside of the inner tube from the outside of the outer tube. A wafer is mounted on a boat inside the inner tube. A rotation cap(144) rotates the boat, supporting the boat. The cap cover(246) can be split up into right and left cap covers(246a,246b), disposed under the rotation cap. A base seals the space inside the inner tube, disposed under the cap cover and contacting the flange.
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