| 摘要 |
PURPOSE: An organic antireflective coating composition, a method for forming a photoresist pattern by using the composition and a semiconductor device prepared by the method are provided, to remove the standing wave and to improve the uniformity of a photoresist pattern by minimizing the reflectance of an antireflective coating. CONSTITUTION: The organic antireflective coating composition comprises a crosslinking agent for allowing a formed antireflective coating to have the crosslinked structure; a light absorbent having a high absorbance in the wavelength range of an exposure light source; a thermal acid generator; an organic solvent; and the poly(dimethylsiloxane) having a molecular weight of 14,000-21,000 represented by the formula 1. Preferably the light absorbent is the poly(vinyl phenol) represented by the formula 2; and the crosslinking agent is the polymer having a molecular weight of 3,000-100,000 represented by the formula 3, wherein R1 and R2 are a linear or branched substituted alkyl group of C1-C10, R3 is H or CH3. |
