发明名称 |
RESIST PEELING APPARATUS |
摘要 |
PURPOSE: To provide a resist peeling apparatus capable of preventing a variance in concentration of an effective component contained in a resist peeling solution, reducing the amount of the solution used and reducing the amount of waste gas to be treated. CONSTITUTION: The resist peeling apparatus 100 has a rinsing system 2 with a rinsing chamber 21, which is provided on a resist peeling system 1 with a plurality of resist stripping chambers 11 arranged in succession. The resist peeling chambers 11 are purged with gaseous nitrogen from a gaseous nitrogen supply system 7. A gaseous mixture containing a component of an aqueous resist peeling solution R1 generated in the chambers 11 is sent to a liquid recovery-supply system 3 and subjected to gas-liquid separation. A recovered resist peeling solution R2 is returned to a peeling solution tank 13 and a separated gas G is used for dewatering a substrate W supplied to each gas knife 12 in the chambers 11.
|
申请公布号 |
KR20040010252(A) |
申请公布日期 |
2004.01.31 |
申请号 |
KR20030049225 |
申请日期 |
2003.07.18 |
申请人 |
HIRAMA LABORATORIES CO., LTD.;NAGASE & CO., LTD.;NAGASE CMS TECHNOLOGY CO., LTD. |
发明人 |
NAKAGAWA TOSHIMOTO;OGAWA SHU;MORITA SATORU;KOBAYAKAWA YASUYUKI;KIKUKAWA MAKOTO |
分类号 |
G03F7/42;H01L21/00;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|