| 摘要 |
<p>High permittivity multilayer structure comprises a number of superposed layers, each of thickness less than 500 Å. The layer structure includes two layers based on a mixed oxide derived from titanium oxide (TiO 2) and tantalum pentoxide (Ta 2O 5) separated by a layer based on a mixed oxide derived from at least hafnium dioxide (HfO 2) and alumina (Al 2O 3). Preferred Features: The mixed oxide derived from at least hafnium dioxide (HfO2) and alumina (Al2O3) can also include zirconium dioxide (ZrO 2) in its composition. At least one layer situated between the layers of mixed oxide derived from titanium oxide and tantalum pentoxide and the outer part of the structure comprises a mixed oxide derived from at least two materials selected from hafnium dioxide (HfO 2), alumina (Al 2O 3), zirconium oxide (ZrO 2), titanium dioxide (TiO 2), and tantalum pentoxide (Ta 2O 5). The thickness of each layer is 1-200 Å, preferably 1-100 Å, and most preferably 1-50 Å. At least one of the external layers is alumina (Al 2O 3). Each layer is deposited by atomic layer deposition (ALD).</p> |
