发明名称 |
ILLUMINATING OPTICAL SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD |
摘要 |
<p>An illuminating optical system substantially free from micro-channel in a diffractive optics disposed on the optical path of a laser beam having a high energy density. An illuminating optical system having a light source (1) for supplying a pulse laser beam that is used to illuminate a surface to be illuminated (M). A diffractive optics (4) disposed on an optical path is provided, the optical path being provided between a light source and a surface to be illuminated to allow a light flux having an energy density of at least 1 mJ/cm<2>/pulse to pass through. The diffractive optics is formed of an oxide crystal material such as quartz.</p> |
申请公布号 |
WO2004010483(A1) |
申请公布日期 |
2004.01.29 |
申请号 |
WO2003JP07692 |
申请日期 |
2003.06.17 |
申请人 |
NIKON CORPORATION;TOYODA, MITSUNORI |
发明人 |
TOYODA, MITSUNORI |
分类号 |
G02B5/18;G02B1/02;G02B3/00;G02B19/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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