发明名称 ILLUMINATING OPTICAL SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD
摘要 <p>An illuminating optical system substantially free from micro-channel in a diffractive optics disposed on the optical path of a laser beam having a high energy density. An illuminating optical system having a light source (1) for supplying a pulse laser beam that is used to illuminate a surface to be illuminated (M). A diffractive optics (4) disposed on an optical path is provided, the optical path being provided between a light source and a surface to be illuminated to allow a light flux having an energy density of at least 1 mJ/cm&lt;2&gt;/pulse to pass through. The diffractive optics is formed of an oxide crystal material such as quartz.</p>
申请公布号 WO2004010483(A1) 申请公布日期 2004.01.29
申请号 WO2003JP07692 申请日期 2003.06.17
申请人 NIKON CORPORATION;TOYODA, MITSUNORI 发明人 TOYODA, MITSUNORI
分类号 G02B5/18;G02B1/02;G02B3/00;G02B19/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B5/18
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