| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an excellent photosensitive resin composition having satisfactory transmittance and ensuring high contrast in dissolution, small line edge roughness and slight trailing. <P>SOLUTION: The photosensitive resin composition is characterized by containing (A) a resin which contains a repeating unit having a group of formula (Y) and is decomposed by the action of an acid to increase solubility in an alkali developing solution (e.g., a resin containing a group of formula (II-1) or (Y-1) as a repeating unit), and at least two compounds selected from the group consisting of (B1) a compound which generates an aliphatic or aromatic sulfonic acid substituted by at least one fluorine atom upon irradiation with an actinic ray or a radiation, (B2) a compound which generates an aliphatic or aromatic sulfonic acid not containing a fluorine atom upon irradiation with an actinic ray or a radiation, (B3) a compound which generates an aliphatic or aromatic carboxylic acid substituted by at least one fluorine atom upon irradiation with an actinic ray or a radiation, and (B4) a compound which generates an aliphatic or aromatic carboxylic acid not containing a fluorine atom upon irradiation with an actinic ray or a radiation. <P>COPYRIGHT: (C)2004,JPO |
