| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for aligning a mask and a work which can accurately align the mask and the work, and to provide a projection aligner. SOLUTION: In the projection aligner 1, a confirming means 6 includes a filter 61 for removing a photosensitive wavelength of a photoresistor coating the work from an emitted light from a light emitting unit, an advancing/retracting means 62 for advancing the filter to an optical path of the emitted light or retracting the filter from the optical path, an imaging means 63 for capturing and imaging a reflected light of the emitted light emitted to the work via the mask and a projecting lens through the filter, and projecting/retracting means 64 for projecting or retracting the imaging means from or in the optical path of the reflected light. COPYRIGHT: (C)2004,JPO
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