发明名称 |
METHOD AND DEVICE FOR DETECTING WAFER TEMPERATURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a detection device of a wafer temperature for easily and precisely managing the temperature of the wafer. SOLUTION: The wafer 6 placed on a susceptor 5 is sucked to a susceptor 5-side with electrostatic suction force by application of output voltage of a variable DC power source 22. A temperature characteristic obtained by detecting the temperature of the wafer 6 against the respective output voltages by changing the output voltages of the variable DC power source 22, while the temperature of the wafer 6 is measured is stored in a temperature characteristic storage part 21. A voltage detector 23 detects the output voltages of the variable DC power source 22. A voltage signal being an output signal of the voltage detector 23 is inputted to the temperature characteristic storage part 21 and the temperature of the wafer 6 is specified based on the temperature characteristic. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004031554(A) |
申请公布日期 |
2004.01.29 |
申请号 |
JP20020184160 |
申请日期 |
2002.06.25 |
申请人 |
MITSUBISHI HEAVY IND LTD |
发明人 |
KONO YUICHI;MATSUDA RYUICHI;INOUE MASAHIKO |
分类号 |
C23C16/458;H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
C23C16/458 |
代理机构 |
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地址 |
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