| 摘要 |
A photolithography tool includes an anode and a cathode composed of a first material and a second material. The second material has a lower work function than the first material. Electrons emitted from the cathode ionize a gas into a plasma that generates EUV light. The EUV light is focused on a mask to produce an image of a circuit pattern. The image is projected on a semiconductor wafer to produce a circuit.
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