SYSTEM AND METHOD FOR MASKLESS LITHOGRAPHY USING AN ARRAY OF IMPROVED DIFFRACTIVE FOCUSING ELEMENTS

摘要

A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.