SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD, PROGRAM, AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment technique which, when an abnormality is detected in treatment results, can easily clear up its cause. SOLUTION: When a polymer is removed by a substrate treatment apparatus 3, a control element is monitored by a sensor 30, and a data collection part 441 collects its change with time and accumulate it as a data file 445 in a magnetic disk 44. The contents of the data file 445 are the temporal profile of the control element, and the variation of the control element during treatment is recorded. The change of the control element with the passage of time is collected for each of substrates W subjected to polymer removal treatment by the substrate treatment apparatus 3, and while each substrate W and the change of the control element with the passage of time collected for the substrate are made to correspond to each other by a control element table 446, the change of the control element with time is accumulated in the magnetic disk 44. COPYRIGHT: (C)2004,JPO