发明名称 Method for improving contact hole patterning
摘要 An LCD panel is provided, the LCD panel having a substrate, a conductive layer positioned on the substrate, and a dielectric layer disposed on the surface of the conductive layer. First, a photoresist layer with an opening is formed on the dielectric layer. An etching process is then performed to form a contact hole along the opening. After that, a post treatment process is performed to form a protective layer to reduce damage on the conductive layer when the photoresist layer is stripped.
申请公布号 US2004018656(A1) 申请公布日期 2004.01.29
申请号 US20020065780 申请日期 2002.11.18
申请人 TSAI YAW-MING 发明人 TSAI YAW-MING
分类号 G02F1/1343;G02F1/1362;G03F7/40;H01L21/768;H01L27/146;(IPC1-7):H01L21/00;H01L21/44;H01L21/26;H01L21/324;H01L21/42;H01L21/477 主分类号 G02F1/1343
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