| 摘要 |
The invention concerns an illumination system, particularly for microlithography with wavelengths <=93 nm, comprising: a primary light source; a first optical component; a second optical component; an image plane; and an exit pupil; wherein said first optical component transforms said primary light source into a plurality of secondary light sources that are imaged by said second optical component in said exit pupil, wherein said first optical component includes a first optical element having a plurality of first raster elements, that are imaged into said image plane, producing a plurality of images being superimposed at least partially on a field in said image plane, wherein said plurality of first raster elements are rectangular, wherein said filed is a segment of an annulus, and wherein said second optical component includes a first field mirror with negative optical power for shaping said field to said segment of said annulus and a second field mirror with positive optical power, wherein each of a plurality of rays intersects said first field mirror with an incidence angel greater than 70° and wherein each of a plurality of rays intersects said second field mirror with an incidence angle of less than 25°.
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