发明名称 POSITIVE RADIATION-SENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To obtain a positive radiation-sensitive composition having high sensitivity, high resolution, good adhesion to a substrate, and a good affinity for an alkali developing solution. <P>SOLUTION: The positive radiation-sensitive composition comprises (a) a polymer containing a structural unit which becomes alkali-soluble by the action of an acid, a structural unit having a lactone skeleton and a structural unit having a phenolic hydroxyl group, and (b) an acid generator which generates an acid upon irradiation with a radiation. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004029437(A) 申请公布日期 2004.01.29
申请号 JP20020186416 申请日期 2002.06.26
申请人 TORAY IND INC 发明人 SENOO MASAHIDE;TAMURA KAZUTAKA;NIO HIROYUKI
分类号 G03F7/039;C08F212/14;C08F220/16;C08F220/28;C08F220/30;H01L21/027 主分类号 G03F7/039
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